Scientific direction Development of key enabling technologies
Transfer of knowledge to industry

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Technological challenges >> Advanced nano characterization
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Development of combined cathodoluminescence and photosensitive Kelvin probe force microscopy protocol for LED applications

Département des Plateformes Technologiques (LETI)

Laboratoire Analyses de Surfaces et Interfaces

01-06-2021

PsD-DRT-21-0088

Lukasz.Borowik@cea.fr

During this post-doc fellowship, the applicant will be involved in development of very innovative characterisation techniques. More specifically: (1) CL mapping will be compared with KPFM photovoltage mapping on different types of materials (GaN and InGaN) to see the impact of defects (e.g. dislocations, V-pits, etc.) on measured signals. Analysis protocol will be developed to properly compare the KPFM and CL measurement, (2) the protocol of sample preparation will be developed to mark the sample on desired area. This preparation will allow to perform the both characterization techniques within the same sample area and will allow to analyze the proportion of radiative and non-radiative recombinations on defects, (3) pump-probe KPFM will be tested to obtain recombination time of non-radiative process. The applicant must be strongly motivated to learn how to handle advanced UHV facilities and analyse the data. He will have the opportunity to develop transverse skills as the work will be carried out with academic collaborators, and will involve issues of intellectual property, industrial experience with the LETI partners and a daily practise of the English language. Proper background in solid-state physics is essential. Basic knowledge about scanning probe microscopy or/and luminescence techniques is not mandatory but will be appreciated.

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